Modeling precursor diffusion and reaction of atomic layer deposition in porous structures

Atomic layer deposition in porous structures: 3D photonic crystals

This paper reports recent results from studies of atomic layer deposition for the infiltration of three-dimensional photonic crystals. Infiltration of ZnS:Mn and TiO2 are reported for SiO2-based opal templates. It has been demonstrated that high filling fractions can be achieved and that the infiltrated material can be of high crystalline quality as assessed by photoluminescence measurements. T...

Modelling of Precursor Flow and Deposition in Atomic Layer Deposition Reactor

A calculalion modcl to study alornic layer dcposifiorl (A1 ,I)) in low-pressure charinel-type CVI) rcactor with many par;illcl suhstrattrs is dcscrihccl. 'I'hc calcul;ltions are based on continuity equation and kinetic equation For su~facc covelagc Iiormation o r : L stc;%dy-statc :~d:;orption wavc propagating bctwccn the substrates during a precursor pulse is str~dicd. l 'hc effect of diffusi(...

Impact of Atomic Layer Deposition to Nanophotonic Structures and Devices

*Correspondence: Muhammad Rizwan Saleem, Center for Energy Systems (CES), USAID Center for Advance Studies, National University of Sciences and Technology (NUST), Sector H-12, Islamabad 44000, Pakistan e-mail: [email protected]; [email protected] We review the significance of optical thin films by Atomic Layer Deposition (ALD) method to fabricate nanophotonic devices and structures. A...

In Situ Reaction Mechanism Studies on Atomic Layer Deposition

Reaction Path Analysis for Atomic Layer Deposition Processes

In this paper, we examine the mathematical structure of thin-film deposition process reaction kinetics models with the goal of determining whether a reaction network can guarantee the self-limiting and stable growth inherent in true atomic layer deposition systems. This analysis is based on identifying reaction invariants and interpreting the chemical significance of these conserved modes. A sp...